Timeline
- Year
- 2001
- Release date
- Unknown
- Type
- process
0.13 micron featuresArF lithography (193nm)Strained siliconPhase shift masks50+ million transistors
130 nm Process Node
Process node introducing strained silicon for performance
Quality
- Confidence
- 75%
- Source authority
- primary
- Last verified
- Unknown
processsemiconductorfabrication130nm