Semiconductor Process Nodes
10 μm Process Node
Early semiconductor process node used for Intel 4004 and early microprocessors
10 micron featuresPMOS technologyContact lithographyLow transistor densityManual mask alignment
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A living map of breakthroughs across memory, processors, motors, and more. Use advanced search operators for precise filtering.
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Navigator1971 | 17 buckets
CPU
Electric Motors
Graphics Processing Units
Lithography Physics
Memory
Microprocessors
Operating Systems
Optical Lithography
Programming Languages
RAM
Semiconductor Process Nodes
Smartphone
Storage Technologies
iPhone
1971
1975
Semiconductor Process Nodes
3 μm Process Node
Process node enabling higher integration for 8-bit processors
3 micron featuresNMOS technologyProjection lithographyIncreased densityg-line lithography (436nm)
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Sources
1982
Semiconductor Process Nodes
1.5 μm Process Node
Process technology for 80286 and early 32-bit processors
1.5 micron featuresCMOS adoptioni-line lithography (365nm)Improved scalingMulti-level metallization
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