Timeline/Category/32 nm Process Node

32 nm Process Node

Second-generation high-k metal gate process

Timeline

Year: 2009
Release date: 2009-11-17
Type: process

32 nanometer featuresImproved HKMGDouble patterningArF immersion (193nm)Quad-core mainstream

Quality

Confidence: 75%
Source authority: primary
Last verified: Unknown

processsemiconductorfabrication32nm

Relations

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Generation links

Previous

45 nm Process Node (2007)

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22 nm Process Node (FinFET) (2012)

Sources

https://www.intel.com/pressroom/archive/releases/2009/20091117comp.htm

32 nm Process Node | Technology Timeline