Timeline
- Year
- 2007
- Release date
- 2007-11-12
- Type
- process
45 nanometer featuresHigh-k metal gateHafnium-based dielectricsArF immersion lithography820+ million transistors
45 nm Process Node
First process with high-k metal gate transistors
Quality
- Confidence
- 75%
- Source authority
- primary
- Last verified
- Unknown
processsemiconductorfabrication45nmhkmg