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Optical Aberrations in Lithography

Lens imperfections affecting lithographic image quality, described by Ludwig von Seidel

Timeline

Year
1857
Release date
Unknown
Type
principle
Spherical aberrationComaAstigmatismField curvatureDistortionZernike polynomials

Quality

Confidence
75%
Source authority
primary
Last verified
Unknown
opticsaberrationsimagingseidel
Optical Aberrations in Lithography | Technology Timeline