Lithography Physics
Optical Aberrations in Lithography
Lens imperfections affecting lithographic image quality, described by Ludwig von Seidel
Spherical aberrationComaAstigmatismField curvatureDistortionZernike polynomials
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Optical Lithography
Depth of Focus
Axial range over which acceptable image quality is maintained
DOF = k2 × λ / NA²Inverse NA squaredProcess latitudeWafer topography toleranceResolution trade-off
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Optical Lithography
Numerical Aperture
Measure of light-gathering ability and resolving power of optical systems, defined by Ernst Abbe
NA = n × sin(θ)Refractive index dependentAcceptance angleResolution determining factorDepth of focus relationship
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