Timeline
- Year
- 1950
- Release date
- Unknown
- Type
- principle
Photoactive compoundsDissolution rate modulationPositive and negative resistsChemical amplificationMolecular weight changes
Photoresist Chemistry
Chemical processes underlying light-sensitive polymers in lithography
Quality
- Confidence
- 75%
- Source authority
- primary
- Last verified
- Unknown
chemistryphotoresistpolymerslithography