Timeline/Category/Partial Coherence in Lithography

Partial Coherence in Lithography

Role of spatial and temporal coherence in optical lithography imaging

Timeline

Year: 1960
Release date: Unknown
Type: principle

Coherence factor sigmaSpatial coherence controlContrast enhancementIllumination optimizationImaging performance

Quality

Confidence: 75%
Source authority: primary
Last verified: Unknown

opticscoherencelithographyimaging

Relations

Categories

Parents

None

Children

None

Generation links

Previous

Photoresist Chemistry (1950)

Next

Electron Beam Lithography Physics (1960)

Sources

https://www.spiedigitallibrary.org/ebooks/PM/Fundamental-Principles-of-Optical-Lithography/6/Aerial-Image-Formation-The-Role-of-Coherence/10.1117/3.601520.ch6

Partial Coherence in Lithography | Technology Timeline